THIN FILM FORMING DEVICE

专利名称：THIN FILM FORMING DEVICE发明人：OTA WASABURO,TANAKA

MAKOTO,NAKAZAWA MASASHI

申请号：JP12452490申请日：19900515公开号：JPH0421772A公开日：19920124

摘要：PURPOSE:To uniformize the thickness and properties of a thin film in the devicein which a material vaporized from a source is ionized by the thermoelectron from afilament and accelerated by an electric field leading to a counter electrode from a gridby providing an auxiliary electrode for adjusting the electric field distribution.

CONSTITUTION:An active gas, etc., are introduced into a vacuum vessel from a pipe 4.Electrodes 10-14 electrically insulated from a plate 2 are used to electrically connect theinside and outside of a vacuum vessel and to support a counter electrode 5, filament 8,resistance-heated vaporization source 9 and grid 7. The expansion of the particles of thematerial vaporized from the source 9 is covered by the filament 8. The vaporized materialis passed toward the electrode 5 through the grid 7, and a substrate 100 is supported onthe surface of the electrode 5 opposed to the source 9. An auxiliary electrode 6 isprovided between the counter electrode 5 and the grid 7, and a potential is imparted tothe auxiliary electrode from a power source 23 to change the distribution of the electricfield leading to the counter electrode 5. Consequently, the flying direction and the ioncurrent density are controlled, and a uniform thin film is formed on the large-areasubstrate.

申请人：RICOH CO LTD

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